Seika Machinery, Inc., a leading provider of advanced machinery, materials and engineering services, together with HIROX-USA, announces that it will highlight the HIROX series of digital microscopes at the IMAPS/NASA/JPL Topical Workshop & Exhibition on Counterfeit Electronic Parts; Awareness, Avoidance, Detection and Mitigation, scheduled to take place Thursday, October 1, 2009 at the Radisson Hotel in Los Angeles.
The HIROX Systems are dedicated digital microscopes, allowing a sample to be observed directly through a lens. The microscopes have been optimized for the characteristics of the imaging sensor — a flat, 2-D array with a known readout rate, response curve, pixel size, etc.
In a conventional microscope, the optics of the eye have to be figured into the design parameters and that requirement may be different from, and potentially conflict with, those that would produce optimal images with an electronic imaging sensor. Because the HIROX microscopes have been designed only for digital imaging, no compromises have been made to accommodate the eye’s optics. However, the systems are, in fact, often able to take advantage of sight physiology and visual signal processing to provide unique observational capabilities, i.e. 3-D rotational microscopy.
Objects may be inspected dynamically in 360° with the patented HIROX design. Additionally, using the microscopes, superior BGA inspection is capable up to 200X magnification. Low maintenance costs are achieved with the use of a spring loaded lens tip to protect samples. Additionally, the microscopes are highly configurable and feature a flexible lineup of lenses and peripheral devices. Other standard features include optimal illumination using a metal halide lamp for balanced color spectrum, a multitude of 2-/3-D profiling features are available for a wide range of applications, and customization is available for tailoring to client-specific needs.
Two models are available: KH-1330 and KH-7700. For more information about the digital microscopes, visit Seika Machinery at the IMAPS/NASA/JPL Topical Workshop & Exhibition